Wavelet Environment Matting
| dc.contributor.author | Peers, Pieter | en_US |
| dc.contributor.author | Dutré, Philip | en_US |
| dc.contributor.editor | Philip Dutre and Frank Suykens and Per H. Christensen and Daniel Cohen-Or | en_US |
| dc.date.accessioned | 2014-01-27T14:22:47Z | |
| dc.date.available | 2014-01-27T14:22:47Z | |
| dc.date.issued | 2003 | en_US |
| dc.description.abstract | In this paper we present a novel approach for capturing the environment matte of a scene. We impose no restrictions on material properties of the objects in the captured scene and exploit scene characteristics (e.g. material properties and self-shadowing) to minimize recording time and to bound the error. Using a CRT monitor, wavelet patterns are emitted onto the scene in order of importance to efficiently construct the environment matte. This order of importance is obtained by means of a feedback loop that takes advantage of the knowledge learned from previously recorded photographs. Once the recording process is finished, new backdrops can be efficiently placed behind the scene. | en_US |
| dc.description.seriesinformation | Eurographics Workshop on Rendering | en_US |
| dc.identifier.isbn | 3-905673-03-7 | en_US |
| dc.identifier.issn | 1727-3463 | en_US |
| dc.identifier.uri | https://doi.org/10.2312/EGWR/EGWR03/157-166 | en_US |
| dc.publisher | The Eurographics Association | en_US |
| dc.title | Wavelet Environment Matting | en_US |
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