Khattar, ApoorvZhu, JunqiuYan, Ling‐QiMontazeri, Zahra2025-03-072025-03-0720251467-8659https://doi.org/10.1111/cgf.15283https://diglib.eg.org/handle/10.1111/cgf15283Rendering woven fabrics is challenging due to the complex micro geometry and anisotropy appearance. Conventional solutions either fully model every yarn/ply/fibre for high fidelity at a high computational cost, or ignore details, that produce non‐realistic close‐up renderings. In this paper, we introduce a model that shares the advantages of both. Our model requires only binary patterns as input yet offers all the necessary micro‐level details by adding the yarn/ply/fibre implicitly. Moreover, we design a double‐layer representation to handle light transmission accurately and use a constant timed () approach to accurately and efficiently depict parallax and shadowing‐masking effects in a tandem way. We compare our model with curve‐based and surface‐based, on different patterns, under different lighting and evaluate with photographs to ensure capturing the aforementioned realistic effects.Attribution 4.0 International Licenserenderingray tracingreflectance and shading models• Computing methodologies → Reflectance modelling; Ray Tracing; Rendering;10.1111/cgf.1528314